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采用平面分柵結(jié)構(gòu)的高增益寬帶射頻VDMOS研制
2021年電子技術(shù)應(yīng)用第7期
于 淼1,,2,,3,,宋李梅1,,2,,3,,李 科2,,3,,叢密芳2,3,李永強(qiáng)2,,3,,任建偉2,3
1.中國(guó)科學(xué)院大學(xué),,北京100049,;2.中國(guó)科學(xué)院微電子研究所,北京100029,; 3.中國(guó)科學(xué)院硅器件技術(shù)重點(diǎn)實(shí)驗(yàn)室,,北京100029
摘要: 硅基射頻場(chǎng)效應(yīng)晶體管具有線性度好、驅(qū)動(dòng)電路簡(jiǎn)單,、開關(guān)速度快,、熱穩(wěn)定性好、沒有二次擊穿等優(yōu)點(diǎn),,在HF,、VHF和UHF波段具有廣闊的應(yīng)用前景。針對(duì)射頻場(chǎng)效應(yīng)晶體管寬帶,、高增益和高效率的應(yīng)用需求,,基于標(biāo)準(zhǔn)平面MOS工藝,,采用平面分柵(split gate)結(jié)構(gòu),,通過優(yōu)化結(jié)構(gòu)和工藝參數(shù)研制出一款工作電壓為28 V的硅基射頻垂直雙擴(kuò)散金屬氧化物半導(dǎo)體場(chǎng)效應(yīng)晶體管(VDMOS)。該器件在30~90 MHz頻段范圍內(nèi),,小信號(hào)增益大于19 dB,,在60 MHz頻點(diǎn)下連續(xù)波輸出功率可以達(dá)到87 W,功率附加效率達(dá)72.4 %,,具有優(yōu)異的射頻性能,。
中圖分類號(hào): TN386.1
文獻(xiàn)標(biāo)識(shí)碼: A
DOI:10.16157/j.issn.0258-7998.201192
中文引用格式: 于淼,宋李梅,,李科,,等. 采用平面分柵結(jié)構(gòu)的高增益寬帶射頻VDMOS研制[J].電子技術(shù)應(yīng)用,2021,,47(7):1-4,,11.
英文引用格式: Yu Miao,Song Limei,,Li Ke,,et al. Development of high-gain broadband RF VDMOS using planar split gate structure[J]. Application of Electronic Technique,2021,,47(7):1-4,,11.
Development of high-gain broadband RF VDMOS using planar split gate structure
Yu Miao1,2,3,,Song Limei1,,2,3,,Li Ke2,,3,Cong Mifang2,,3,,Li Yongqiang2,3,,Ren Jianwei2,,3
1.University of Chinese Academy of Sciences,Beijing 100049,,China,; 2.Institute of Microelectronics of Chinese Academy of Sciences,Beijing 100029,,China,; 3.Key Laboratory of Science and Technology on Silicon Devices,Chinese Academy of Sciences,,Beijing 100029,,China
Abstract: Silicon-based radio frequency field effect transistors have the advantages of excellent linearity, simple drive circuit, fast switching speed, excellent thermal stability, no secondary breakdown, etc., and have broad application prospects in HF, VHF and UHF bands. In view of the application requirements of the RF field effect transistors with broadband, high gain and high efficiency, based on the standard planar MOS process, the split gate structure was adopted and a silicon-based RF vertical double-diffused metal oxide semiconductor field effect transistor with working voltage of 28 V was developed by optimizing the structure and process parameters. In the frequency range from 30 MHz to 90 MHz, the device can achieve small signal gain greater than 19 dB, the continuous wave output power can reach 87 W at the frequency of 60 MHz, the power added efficiency up to 72.4%, has excellent radio frequency performance.
Key words : radio frequency;field effect transistor,;split gate,;high gain;broadband

0 引言

    硅基射頻場(chǎng)效應(yīng)晶體管作為固態(tài)功率器件,,與雙極型晶體管相比,,具有線性度好、驅(qū)動(dòng)電路簡(jiǎn)單,、開關(guān)速度快,、熱穩(wěn)定性好、沒有二次擊穿和可以多胞并聯(lián)輸出大功率等一系列優(yōu)點(diǎn)[1-2],,在高頻(HF),、甚高頻(VHF)和特高頻(UHF)波段(如移動(dòng)通信、廣播,、超視距雷達(dá),、磁共振成像、射頻加熱和無線電接收器等領(lǐng)域)得到廣泛應(yīng)用[3-4],。近幾年來,,雖然氮化鎵(GaN)器件市場(chǎng)發(fā)展迅速,,但是由于GaN材料加工工藝復(fù)雜,成本較高,,主要適用于3.5 GHz或更高頻段的高頻大功率應(yīng)用場(chǎng)合,,而在較低頻段,硅基射頻垂直雙擴(kuò)散金屬氧化物半導(dǎo)體場(chǎng)效應(yīng)晶體管(Vertical Double-diffused Metal Oxide Semiconductor field effect transistor,,VDMOS)由于成熟度和性價(jià)比更高而更具優(yōu)勢(shì),,因此,硅基射頻VDMOS主要應(yīng)用在低頻寬帶大功率和對(duì)可靠性要求較高的領(lǐng)域[5-7],。




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作者信息:

于  淼1,2,,3,,宋李梅1,2,,3,,李  科2,3,,叢密芳2,,3,李永強(qiáng)2,,3,,任建偉2,3

(1.中國(guó)科學(xué)院大學(xué),,北京100049,;2.中國(guó)科學(xué)院微電子研究所,北京100029,;

3.中國(guó)科學(xué)院硅器件技術(shù)重點(diǎn)實(shí)驗(yàn)室,北京100029)




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